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UV annealing of low temperature photodeposited SiO2 films with a new powerful lamp source

✍ Scribed by C. Debauche; C. Licoppe; C. Meriadec; F. Sartoris; J. Flicstein


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
311 KB
Volume
54
Category
Article
ISSN
0169-4332

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