✦ LIBER ✦
Use of SIMS for determining the segregation coefficient of boron at the SiSiO2interface in steam oxidation following ion implantation
✍ Scribed by An, Dao Khac ;Pavlyák, F.
- Publisher
- John Wiley and Sons
- Year
- 1986
- Tongue
- English
- Weight
- 191 KB
- Volume
- 95
- Category
- Article
- ISSN
- 0031-8965
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