## Abstract The results of a study of oxide precipitates in Czochralski (CZ) grown silicon using two X‐ray diffraction methods are reported. The diffuse scattering around the Bragg diffraction maxima was measured on a series of samples after various two‐stage annealing treatment. Combining the anal
✦ LIBER ✦
Use of neutron and X-ray diffraction to study the precipitation mechanisms of oxides in ODS materials
✍ Scribed by L. Toualbi; M. Ratti; G. André; F. Onimus; Y. de Carlan
- Book ID
- 113731392
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 406 KB
- Volume
- 417
- Category
- Article
- ISSN
- 0022-3115
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