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Uniformity, Structure, and Photocatalytic Activity of TiO 2 Films Deposited by Atmospheric-Pressure Linear Cold Plasma

✍ Scribed by Di, Lan-Bo; Shi, Chuan; Li, Xiao-Song; Liu, Jing-Lin; Zhu, Ai-Min

Book ID
118214058
Publisher
John Wiley and Sons
Year
2012
Tongue
English
Weight
527 KB
Volume
18
Category
Article
ISSN
0948-1907

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## Abstract Titanium dioxide thin films were deposited near room temperature by plasma based ion implantation and deposition with the voltage pulses, accelerating the ions towards the substrate, ranging from 0 kV to 10 kV. Correspondingly, an increase of average energy per deposited particle from 2