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Uniform target ablation in pulsed-laser deposition

✍ Scribed by N. Arnold; D. Bäuerle


Publisher
Springer
Year
1999
Tongue
English
Weight
171 KB
Volume
68
Category
Article
ISSN
1432-0630

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In this work a frequency-doubled Nd:glass laser with a pulse duration of 250 fs has been used to ablate a TaC target and to deposit thin films on silicon. The results have been compared with those previously obtained by nanosecond pulsed laser deposition and evidence of large differences in the plas