Enhancement of two-dimensional electron
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Hashimoto, Shin ;Akita, Katsushi ;Yamamoto, Yoshiyuki ;Ueno, Masaki ;Nakamura, T
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Article
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2012
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John Wiley and Sons
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English
⚖ 328 KB
## Abstract We have demonstrated a high sheet carrier concentration in AlGaN‐channel high‐electron‐mobility transistors (HEMTs) with AlN barrier layer. We investigate the epitaxial structure of these HEMTs by X‐ray diffraction and reveal that the partial lattice relaxation occurs in the Al~0.51~GaN