A patterned soft elastomeric substrate is utilized for fabricating an all-polymer thin film transistor (TFT). With a polymer solution for the source/drain electrodes, it is difficult to form a well defined narrow channel. The problem is resolved with the aid of a micromolding technique and the patte
โฆ LIBER โฆ
Ultraviolet-Patternable Polymer Insulator for Organic Thin-Film Transistors on Flexible Substrates
โ Scribed by Wu, Chung-Ming; Su, Shui-Hsiang; Wang, Hong-Tai; Yokoyama, Meiso; Fu, Shen-Li
- Book ID
- 127237764
- Publisher
- Institute of Pure and Applied Physics
- Year
- 2011
- Tongue
- English
- Weight
- 694 KB
- Volume
- 50
- Category
- Article
- ISSN
- 0021-4922
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
All-polymer thin film transistors on pat
โ
Hyewon Kang; Tae-il Kim; Keon-kook Han; Hong H. Lee
๐
Article
๐
2009
๐
Elsevier Science
๐
English
โ 274 KB
Organic thin-film transistor-driven poly
โ
Sheraw, C. D.; Zhou, L.; Huang, J. R.; Gundlach, D. J.; Jackson, T. N.; Kane, M.
๐
Article
๐
2002
๐
American Institute of Physics
๐
English
โ 626 KB
All-Ink-Jet Printed Flexible Organic Thi
โ
Kim, Dongjo; Lee, Seong Hui; Jeong, Sunho; Moon, Jooho
๐
Article
๐
2009
๐
The Electrochemical Society
๐
English
โ 389 KB
PMMA-based patternable gate insulators f
โ
Tae Gon Kim; Eun Hwan Jeong; Sang Chul Lim; Seong Hyun Kim; Gi Heon Kim; Seung H
๐
Article
๐
2009
๐
Elsevier Science
๐
English
โ 584 KB
All-Inkjet-Printed Organic Thin-Film Tra
โ
Chung, Seungjun; Kim, Seul Ong; Kwon, Soon-Ki; Lee, Changhee; Hong, Yongtaek
๐
Article
๐
2011
๐
IEEE
๐
English
โ 377 KB
Organic thin film transistors on flexibl
โ
Katrin Sidler; Nenad V. Cvetkovic; Veronica Savu; Dimitrios Tsamados; Adrian M.
๐
Article
๐
2010
๐
Elsevier Science
๐
English
โ 448 KB
This paper presents new results on miniaturized pentacene thin film transistors (TFTs) fabricated on a spin coated polyimide (PI) film. Patterning steps, which are vital for the integrity and electrical performance of organic TFTs, were done using resistless shadow-mask lithography with two high pre