✦ LIBER ✦
Ultrathin oxynitridation process through ion implantation in a poly Si1−xGex gate MOS capacitor
✍ Scribed by A.P. Jacob; T. Myrberg; M. Friesel; O. Nur; M. Willander; U. Serincan; R. Turan
- Book ID
- 104420688
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 242 KB
- Volume
- 6
- Category
- Article
- ISSN
- 1369-8001
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