✦ LIBER ✦
Ultrathin HfON/SiO2 dual tunneling layer for improving the electrical properties of metal–oxide–nitride–oxide–silicon memory
✍ Scribed by L. Liu; J.P. Xu; J.X. Chen; F. Ji; X.D. Huang; P.T. Lai
- Book ID
- 118501987
- Publisher
- Elsevier Science
- Year
- 2012
- Tongue
- English
- Weight
- 575 KB
- Volume
- 524
- Category
- Article
- ISSN
- 0040-6090
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