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Ultrathin aluminum oxide gate dielectric on N-type 4H-SiC prepared by low thermal budget nitric acid oxidation

✍ Scribed by Szu-Wei Huang; Jenn-Gwo Hwu


Book ID
114617613
Publisher
IEEE
Year
2004
Tongue
English
Weight
364 KB
Volume
51
Category
Article
ISSN
0018-9383

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