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Ultrasharp Si nanowires produced by plasma-enhanced chemical vapor deposition

✍ Scribed by J. Červenka; M. Ledinský; H. Stuchlíková; J. Stuchlík; Z. Výborný; J. Holovský; K. Hruška; A. Fejfar; J. Kočka

No coin nor oath required. For personal study only.

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