𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Ultrasensitive non-chemically amplified low-contrast negative electron beam lithography resist with dual-tone behaviour

✍ Scribed by Canalejas-Tejero, Víctor; Carrasco, Sergio; Navarro-Villoslada, Fernando; García Fierro, José Luis; Capel-Sánchez, María del Carmen; Moreno-Bondi, María Cruz; Barrios, Carlos Angulo


Book ID
120259528
Publisher
The Royal Society of Chemistry
Year
2013
Tongue
English
Weight
507 KB
Volume
1
Category
Article
ISSN
2050-7526

No coin nor oath required. For personal study only.