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Ultrascaled hafnium silicon oxynitride gate dielectrics with excellent carrier mobility and reliability

✍ Scribed by Quevedo-Lopez, M. A.; Krishnan, S. A.; Kirsch, P. D.; Pant, G.; Gnade, B. E.; Wallace, R. M.


Book ID
119968448
Publisher
American Institute of Physics
Year
2005
Tongue
English
Weight
378 KB
Volume
87
Category
Article
ISSN
0003-6951

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