Ultrapurification of SiCl4 by photochlorination in a bubble column reactor

✍ Scribed by David A. Mixon; Michael P. Bohrer; Patricia A. O'Hara

• Publisher: American Institute of Chemical Engineers
• Year: 1990
• Tongue: English
• Weight: 956 KB
• Volume: 36
• Category: Article
• ISSN: 0001-1541
• DOI: 10.1002/aic.690360207

✦ Synopsis

The development and performance of a bubble column photoreactor for ultrapurification of SiCI, is described. Trichlorosilane (SiHCI,), the principle contaminant in SiCI, commercially available for use in optical fiber manufacture, is converted to SiCI, and HCI by UV-initiated photochlorination. Studies of the homogeneous photochlorination kinetics and of CI, gas absorption in a bubble column were undertaken. In addition, an extensive set of data was collected from continuous-flow bubble column reactor (BCR) runs. The rate of photochlorination in the BCR was found to be mass-transfer-limited. A simple model of BCR performance, incorporating the effect of CI, mass transfer rate enhancement by chemical reaction, was tested that agrees well with the experimental data. The BCR was found to be operable over a wide range of SiHCI, concentrations and SiCI, feed rates, and capable of lowering the concentration of SiHCI, in product to below measurable levels (< 1 ppm).