Ultralow resistance W/poly-Si gate CMOS technology using amorphous-Si/TiN buffer layer

✍ Scribed by Wakabayashi, H.; Yamamoto, T.; Yoshida, K.; Soda, E.; Tokunaga, K.I.; Mogami, T.; Kunio, T.

• Book ID: 114538998
• Publisher: IEEE
• Year: 2002
• Tongue: English
• Weight: 186 KB
• Volume: 49
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.981220