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Ultra-thin metal oxide layers by reactive sputtering: their controlled deposition and characterization


Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
165 KB
Volume
30
Category
Article
ISSN
0042-207X

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πŸ“œ SIMILAR VOLUMES


Ultra-thin silicon-oxide films by sputte
✍ T Serikawa; S Shirai πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 448 KB

This paper describes ultra-thin high-quality silicon oxide (SiO 2 ) films deposited at low temperature by sputtering from a SiO 2 target in an oxygen^argon mixture. SiO 2 films up to a thickness of 6.5 nm are successfully formed on polycrystalline silicon (poly-Si) films which have a surface roughne

XPS and x-ray diffraction characterizati
✍ Asami, K.; Ohnuma, S.; Masumoto, T. πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 368 KB πŸ‘ 2 views

## Thin (x = 0-30 at.% ) alloy Ðlms prepared by a reactive radio frequency (r.f.) sputtering (Co 0.8 Al 0.2 ) 100-x N x method were characterized by XPS and x-ray di †raction (XRD). The Ðlm with no nitrogen consisted of a CsCltype CoAl metallic compound, while the nitrogen-containing alloys were c