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Ultra-shallow junction formation by excimer laser annealing and low energy (<1 keV) B implantation: A two-dimensional analysis

✍ Scribed by G. Fortunato; L. Mariucci; M. Stanizzi; V. Privitera; S. Whelan; C. Spinella; G. Mannino; M. Italia; C. Bongiorno; A. Mittiga


Book ID
114165173
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
353 KB
Volume
186
Category
Article
ISSN
0168-583X

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