๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Ultra-high resolution FESEM


Book ID
104415610
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
67 KB
Volume
5
Category
Article
ISSN
1369-7021

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Ultra-high resolution images
โœ Donaldson, Laurie ๐Ÿ“‚ Article ๐Ÿ“… 2012 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 409 KB
Ultra-High-Resolution electron-beam lith
โœ Craighead, H. G. ๐Ÿ“‚ Article ๐Ÿ“… 1985 ๐Ÿ› Wiley (John Wiley & Sons) ๐ŸŒ English โš– 891 KB

A conventional TEWSTEM has been used for the fabrication of -10 nm-size structures by electron-beam lithography. The electron microscope provides a versatile tool for studying the lithographic process with control of the beam energy, current, and profile combined with the ability to image both the p

New FESEM
๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 789 KB
Single photon imaging at ultra-high reso
โœ R. Bellazzini; G. Spandre; M. Minuti; A. Brez; L. Baldini; L. Latronico; N. Omod ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 1015 KB