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UHV-CVD growth and annealing of thin fully relaxed Ge films on (0 0 1)Si

✍ Scribed by M. Halbwax; M. Rouviere; Y. Zheng; D. Debarre; Lam H. Nguyen; J-L. Cercus; C. Clerc; V. Yam; S. Laval; E. Cassan; D. Bouchier

Book ID: 108233870
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 372 KB
Volume: 27
Category: Article
ISSN: 0925-3467
DOI: 10.1016/j.optmat.2004.08.005

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UHV-CVD growth and annealing of thin fully relaxed Ge films on (0&#xa0;0&#xa0;1)Si

UHV-CVD growth and annealing of thin fully relaxed Ge films on (0 0 1)Si