Two-dimensional phosphorus diffusion for soft drains in silicon MOS transistors

✍ Scribed by F. Lau; U. Gösele

• Publisher: Springer
• Year: 1986
• Tongue: English
• Weight: 684 KB
• Volume: 40
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/bf00616485