Two-dimensional modeling and optimization of a neutral loop discharge etcher in an argon plasma

✍ Scribed by Yaw Okraku-Yirenkyi; Youl-Moon Sung; Masahisa Otsubo; Chikahisa Honda; Tatsuya Sakoda

• Book ID: 108422959
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 386 KB
• Volume: 149
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/s0257-8972(01)01440-2