✦ LIBER ✦
Two Cryogenic Processes Involving SF[sub 6], O[sub 2], and SiF[sub 4] for Silicon Deep Etching
✍ Scribed by Tillocher, T.; Dussart, R.; Overzet, L. J.; Mellhaoui, X.; Lefaucheux, P.; Boufnichel, M.; Ranson, P.
- Book ID
- 125545408
- Publisher
- The Electrochemical Society
- Year
- 2008
- Tongue
- English
- Weight
- 540 KB
- Volume
- 155
- Category
- Article
- ISSN
- 0013-4651
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