Tuning the dipole at the High-κ/SiO2 interface in advanced metal gate stacks

✍ Scribed by M. Charbonnier; C. Leroux; V. Cosnier; P. Besson; F. Martin; G. Ghibaudo; G. Reimbold

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 590 KB
• Volume: 86
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2009.03.105