Trimethylaluminum as a Reducing Agent in the Atomic Layer Deposition of Ti(Al)N Thin Films

✍ Scribed by M. Juppo; P. Alén; M. Ritala; M. Leskelä

• Publisher: John Wiley and Sons
• Year: 2001
• Tongue: English
• Weight: 439 KB
• Volume: 7
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/1521-3862(200109)7:5<211::aid-cvde211>3.0.co;2-l