Transport properties of CrO2 (110) films grown on TiO2 buffered Si substrates by chemical vapor deposition

✍ Scribed by Liu, S. J.; Juang, J. Y.; Wu, K. H.; Uen, T. M.; Gou, Y. S.; Lin, J.-Y.

• Book ID: 111989119
• Publisher: American Institute of Physics
• Year: 2002
• Tongue: English
• Weight: 324 KB
• Volume: 80
• Category: Article
• ISSN: 0003-6951
• DOI: 10.1063/1.1481534