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Transmission Electron Microscopy Study of CuIn3Se5

โœ Scribed by A.-T. Tham; D.S. Su; W. Neumann; P. Schubert-Bischoff; C. Beilharz; K.W. Benz


Publisher
John Wiley and Sons
Year
2000
Tongue
English
Weight
312 KB
Volume
35
Category
Article
ISSN
0232-1300

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Transmission Electron Microscopy Study o
โœ Kyung, H. ;Lee, J.H. ;Yoon, C.S. ;Kim, C.K. ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 296 KB

Low-resistance magnetic tunneling junctions consisting of Ta/NiFe/Cu/NiFe/IrMn/CoFe/Al (6.6 and 7.7 A)-oxide/CoFe/NiFe/Ta were fabricated with the plasma-oxidized insulation layer. Electrical properties and microstructure of the junctions are characterized before and after annealing the junction at