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Transformation from -FeSi to - FeSi2 in RF-sputtered FeSix films

โœ Scribed by Naoki Kawabata; Kazuhiro Nakamura


Book ID
103881002
Publisher
Elsevier
Year
2011
Tongue
English
Weight
402 KB
Volume
11
Category
Article
ISSN
1875-3892

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The dependence of the dielectric constant err chemical composition and crystalline structure of thin titanium oxide films, deposited onto Si substrates, on reactive sputtering conditions has been studied using an RF magnetron operated under different conditions of substrate temperature and 0, + Ar g