Tradeoff Between Hot Carrier and Negative Bias Temperature Degradations in High-Performance $\hbox{Si}_{1 - x}\hbox{Ge}_{x}$ pMOSFETs With High-$k$/Metal Gate Stacks

✍ Scribed by Choi, Won-Ho; Kang, Chang-Young; Oh, Jung-Woo; Lee, Byoung-Hun; Majhi, Prashant; Kwon, Hyuk-Min; Jammy, Raj; Lee, Ga-Won; Lee, Hi-Deok

• Book ID: 120068385
• Publisher: IEEE
• Year: 2010
• Tongue: English
• Weight: 451 KB
• Category: Article
• ISSN: 0741-3106
• DOI: 10.1109/LED.2010.2071851