Towards an optimized image reversal process for half micron lithography

✍ Scribed by M.E. Reuhman-Huisken; C.M.J. Mutsaers; F.A. Vollenbroek; J.A.H.M. Moonen

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 955 KB
• Volume: 9
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(89)90118-4