Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography

✍ Scribed by O’Connor, Naphtali A.; Berro, Adam J.; Lancaster, Jeffrey R.; Gu, Xinyu; Jockusch, Steffen; Nagai, Tomoki; Ogata, Toshiyuki; Lee, Saul; Zimmerman, Paul; Willson, C. Grant; Turro, Nicholas J.

• Book ID: 120159177
• Publisher: American Chemical Society
• Year: 2008
• Tongue: English
• Weight: 498 KB
• Volume: 20
• Category: Article
• ISSN: 0897-4756
• DOI: 10.1021/cm802343u