ToF–SIMS and XPS study of ion implanted 248 nm deep ultraviolet (DUV) photoresist

✍ Scribed by A. Franquet; D. Tsvetanova; T. Conard; R. Vos; G. Vereecke; P.W. Mertens; M.M. Heyns; W. Vandervorst

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 469 KB
• Volume: 88
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2010.06.020