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TOF-SIMS measurement of ultra-thin SiO2 films prepared by the graded-etching method

✍ Scribed by T. Shibamori; Y. Muraji; N. Man; A. Karen

Book ID: 108417841
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 104 KB
Volume: 203-204
Category: Article
ISSN: 0169-4332
DOI: 10.1016/s0169-4332(02)00699-2

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