TiW Silicide gate self-alignment technology for ultra-high-speed GaAs MESFET LSI/VLSI's

✍ Scribed by Yokoyama, N.; Ohnishi, T.; Odani, K.; Onodera, H.; Abe, M.

• Book ID: 114594193
• Publisher: IEEE
• Year: 1982
• Tongue: English
• Weight: 1000 KB
• Volume: 29
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1982.20912