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Titanium nitride films for barrier applications produced by rapid thermal CVD and subsequent in-situ annealing

✍ Scribed by R. Leutenecker; B. Fröschle; U. Cao-Minh; P. Ramm


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
617 KB
Volume
270
Category
Article
ISSN
0040-6090

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