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TiN Metal Gate Electrode Thickness Effect on BTI and Dielectric Breakdown in HfSiON-Based MOSFETs

✍ Scribed by Chien-Liang Chen; Ya-Chin King


Book ID
114620673
Publisher
IEEE
Year
2011
Tongue
English
Weight
1011 KB
Volume
58
Category
Article
ISSN
0018-9383

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