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Tilted angle implantations of B, Al and Ga in single crystalline Si

✍ Scribed by E.H.A. Dekempeneer; P.C. Zalm; C.J. Vriezema; J. Politiek; H.J. Ligthart


Book ID
113280101
Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
631 KB
Volume
42
Category
Article
ISSN
0168-583X

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Implantation of single crystalline iron
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## Abstract The mechanisms of defect formation in single crystalline epitaxial iron garnet thin films implanted with intermediate energy He^+^, B^+^, and Si^+^ ions have been investigated. X‐ray diffraction and modeling of the implantation process are used to show the effectiveness of defect format