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Ti-silicide with improved thermal stability using silicidation through oxide on amorphous silicon substrates

✍ Scribed by Y. S. Hwang; S. H. Paek; S. G. Kang; H. C. Cho; J. S. Choi; S. I. Lee; J. K. Lee


Publisher
Springer
Year
1993
Tongue
English
Weight
715 KB
Volume
12
Category
Article
ISSN
0261-8028

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