Threshold voltage shift of submicron p-channel MOSFET due to Si surface damage from plasma etching process

✍ Scribed by Gwan-Ha Kim; Young-Rog Kang; Whan-Jun Kim; Sang-Yong Kim; Chang-Il Kim

• Book ID: 108289505
• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 750 KB
• Volume: 515
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2006.10.086