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Threshold voltage reduction in strained-Si/SiGe MOS devices due to a difference in the dielectric constants of Si and Ge

✍ Scribed by Zainuddin, A.N.M.; Haque, A.


Book ID
114618034
Publisher
IEEE
Year
2005
Tongue
English
Weight
114 KB
Volume
52
Category
Article
ISSN
0018-9383

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