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Threshold energy of formation of an oxygen vacancy defect in SiO2 by atomic displacements using molecular dynamics

โœ Scribed by F. Mota; M.-J. Caturla; J.M. Perlado; E. Dominguez; A. Kubota


Book ID
108136820
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
104 KB
Volume
75-79
Category
Article
ISSN
0920-3796

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