✦ LIBER ✦
Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system)
✍ Scribed by Hirai, Y.; Tomida, S.; Ikeda, K.; Sasago, M.; Endo, M.; Hayama, S.; Nomura, N.
- Book ID
- 119777588
- Publisher
- IEEE
- Year
- 1991
- Tongue
- English
- Weight
- 844 KB
- Volume
- 10
- Category
- Article
- ISSN
- 0278-0070
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