✦ LIBER ✦
Thin thermal SiO2 after NH3 or N2O plasma action under plasma-enhanced chemical vapor deposition conditions
✍ Scribed by T. Dimitrova; E. Atanassova; G. Beshkov; J. Pazov
- Book ID
- 103431086
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 811 KB
- Volume
- 252
- Category
- Article
- ISSN
- 0040-6090
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