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Thin overlayer influence on electrophysical properties of nickel films

โœ Scribed by T. Hovorun; A. Chornous

Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
263 KB
Volume
41
Category
Article
ISSN
0232-1300

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โœฆ Synopsis

In this work it is experimentally investigated a size effect in temperature coefficient of resistance (ะขCR) of Ni films with Cu and SiO 2 thin overlayer. The parameters of electrical transfer (the mean-free path of electron, the reflectivity coefficient of the external surfaces, the reflection and transmission coefficients at the grain boundary) were calculations. Decreasing of the value of the reflectivity coefficient is due to the change of the surface microrelief. It is show that the value of TCR decreases caused by the conditions of scattering changes on internal and external boundaries.

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