## Abstract The morphology of blockโcopolymer, ionโconductive, electrolyte thin films is studied. Based on PSโbโPEO and the alkali salt Li[N(CF~3~SO~2~)~2~], hybrid structures are probed as a function of Li/PEO ratio. Using optical microscopy, AFM and grazing incidence SAXS, films of 50โnm thicknes
Thin-Film Morphologies of Random Copolymers as Functions of Thermal History
โ Scribed by Daoji Gan; Shiqiang Lu; Zhijian Wang
- Book ID
- 102581388
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 262 KB
- Volume
- 239
- Category
- Article
- ISSN
- 0021-9797
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โฆ Synopsis
Series polymers of butyl methacrylate with various contents of 3-(trimethoxysilyl)propyl methacrylate (MSMA) that introduces crosslinking networks among the macromolecules upon hydrolysis and self-condensation have been synthesized by free radical polymerization, and the influence of crosslinking density on the film properties has been examined. The polymer solutions were spincast over a layer of polystyrene brush to yield homogeneous polymer films. When the films of about 30 nm thick were exposed to moisture and then heated at 60 โข C for hydrolysis and self-condensation of MSMA groups, the initially flat surfaces became slightly coarser but without apparent dewetting. Further annealing at 140 โข C resulted in dewetting of the thin films, whose morphologies in thermodynamic equilibrium were related to the chemical compositions of the polymers. The polymers having higher contents of MSMA exhibited significantly reduced dewetting at the high temperature, due to the higher density of crosslinking networks that restricted the molecular mobility. In contrast to the thin films of about 30 nm thick, thicker films (about 100 nm) showed only a slight dewetting, even non-dewetting at the elevated temperature.
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## Abstract It is well known that chemically patterned substrates can direct the assembly of adsorbed layers or thin films of block copolymers. For a cylinderโforming diblock copolymer on periodically spotโpatterned substrates, the morphology of the block copolymer follows the pattern at the substr