Thickness optimization of the TiN metal gate with polysilicon-capping layer on Hf-based high-k dielectric

✍ Scribed by Sang Ho Bae; Seung-Chul Song; KiSik Choi; Gennadi Bersuker; George A. Brown; Dim-Lee Kwong; Byoung Hun Lee

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 175 KB
• Volume: 83
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2005.11.010