Thickness dependent surface microstructure evolution of bismuth thin film prepared by molecular beam deposition method

Sputter etching effect of the substrate

Sputter etching effect of the substrate on the microstructure of β-FeSi2 thin film prepared by ion beam sputter deposition method

✍ M. Sasase; K. Shimura; K. Yamaguchi; H. Yamamoto; S. Shamoto; K. Hojou 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 643 KB

Beta iron disilicide (b-FeSi 2 ) is one of the candidate materials for a compound semiconductor, which is promising for optoelectronic devices. b-FeSi 2 film has been obtained by ion beam sputter deposition (IBSD) on Si(1 0 0) substrates that are pre-treated by sputter etching by Ne + . In the prese