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Thickness dependence of dielectric breakdown failure of thermal SiO2 films : Kikuo Yamabe, Kenji Taniguchi and Yoshiaki Matsushita. IEEE 21 st Ann. Proc. Reliab. Phys. 184 (1983)


Publisher
Elsevier Science
Year
1984
Tongue
English
Weight
132 KB
Volume
24
Category
Article
ISSN
0026-2714

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