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Thermodynamic simulation of silicon deposition from the gas phase of Si-Cl-H system

✍ Scribed by L. I. Chernyavsky; V. A. Titov; S. V. Sysoev; S. V. Ryzhenkov

Book ID
110166462
Publisher
SP MAIK Nauka/Interperiodica
Year
2009
Tongue
English
Weight
201 KB
Volume
45
Category
Article
ISSN
0020-1685

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## Abstract In the present work are presented the results of the thermodynamic analysis of the interaction processes in the system Si‐C‐H‐Cl in the temperature interval 1000‐3000 K. The equilibrium pressures of the components in the system Si‐C‐H‐Cl with taking account the formation of the condense