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Thermodynamic Calculations of Melt in Melt Pool During Laser Cladding High Silicon Coatings

✍ Scribed by Dan-yang DONG; Chang-sheng LIU; Bin ZHANG

Book ID
117695789
Publisher
Chinese Electronic Periodical Services
Year
2008
Tongue
English
Weight
696 KB
Volume
15
Category
Article
ISSN
1006-706X

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## Abstract The combination of Ge pre‐amorphization implantation, low‐energy boron implantation, and non‐melt laser annealing is a promising method for forming ultrashallow p^+^/n junctions in silicon. In this study, shallow p^+^/n junctions were formed by non‐melt annealing implanted samples using