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Thermally induced accumulation of silicon on palladium silicide surfaces as studied by Auger electron spectroscopy

✍ Scribed by K. Oura; S. Okada; T. Hanawa

Book ID
121871049
Publisher
American Institute of Physics
Year
1979
Tongue
English
Weight
334 KB
Volume
35
Category
Article
ISSN
0003-6951

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## Abstract X‐ray photoelectron spectroscopy (XPS) and Bremsstrahlung‐excited Auger electron spectroscopy (XAES) were used to study the surface composition and oxidation of silicon carbide platelets which had been heated in air at 500–800Β° C. The surface oxide thickness for each heating time and te